Efecto de la potencia de la fuente Dc en la densidad y temperatura electrónica del plasma durante el depósito de películas delgadas de nitruro de tungsteno

Autores/as

  • Manuel Guevara Vera Universidad Nacional de Trujillo.
  • Roberto Machorro Bringas Universidad Nacional Autónoma de México
  • Wilson Camacho Mamani Universidad Nacional de Trujillo

Resumen

En el presente trabajo se determinó el efecto sobre la densidad y temperatura electrónica del plasma debido a la variación de la potencia de la fuente de corriente continua durante el depósito de las películas delgadas de nitruro de tungsteno crecidas sobre sustratos de silicio.
Se utilizó un difractómetro de rayos X, un espectrógrafo y una cámara ICCD. Los espectros fueron utilizados para determinar la densidad y temperatura electrónica del plasma con diferentes valores de potencia. En la medida que incrementa la potencia de la fuente de corriente continua, la temperatura electrónica y la densidad electrónica del plasma varían en forma curvilínea.
Palabras claves: Nitruro de tungsteno, densidad electrónica, temperatura electrónica, películas delgadas, potencia.

ABSTRACT

In this study we determined the effect on density and plasma electronic temperature due to the variation of the DC sputtering power during deposition of thin films of tungsten nitride grown on silicon substrates. To wich we used a X-ray diffractometer, sputtering camera, a spectrograph and ICCD camera. The spectra were used to calculate the density and plasma electronic temperature for each value of power supply. When increased the DC sputtering power, the electron temperature and the plasma electron density have a curvilinear variation.
Key words: Tungsten nitride, electronic density, electronic temperature, thin films, power

Biografía del autor/a

Manuel Guevara Vera, Universidad Nacional de Trujillo.

Prof. del Departamento de Física de la Universidad Nacional de Trujillo, Perú

Roberto Machorro Bringas, Universidad Nacional Autónoma de México

Prof. del Centro de Nanociencias y Nanotecnologías

Wilson Camacho Mamani, Universidad Nacional de Trujillo

Prof. de la Escuela de Postgrado en Ciencias Físicas y Matemáticas de la UNT

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2014-04-30

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